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Nano Biotechnology > Nanotechnology > Nano Imprint Lithography System

Nano Imprint Lithography System

(Available in: Singapore)

The Nano Imprint Lithography (NIL) from Obducat provides solution that allows fabrication of features down to sub 30nm. Using their patented Soft Press Technology, all NIL models enable thermal imprint as standard as well as offering UV upgrade if required. Simultaneous thermal and UV NIL is also possible using the proprietary STU technology. In addition, Obducat also provide the Intermediate Polymer Stamp ( IPS ) to enhance the lifespan of the master stamp thereby reducing cost of manufacturing.

Facts and Advantages
  • Single and double sided imprint
  • Wide range of configuration possibilities
  • Full area imprint
  • Semi-auto and high volume production models also available